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1

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Molecular base sensitivity studies of various DUV resists used in semiconductor fabrication

Ruede, David, Ercken, Monique, Borgers, Tom, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 658 KB

english, 2001

2

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Protecting 248-nm and 193-ηm lithography from airborne molecular contamination during semiconductor fabrication

Grayfer, Anatoly, Kishkovich, Oleg P., Ruede, David, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 283 KB

english, 2001

3

Regime changes in Bitcoin GARCH volatility dynamics

Ardia, David, Bluteau, Keven, Rüede, Maxime

Journal:

Finance Research Letters

Year:

2018

Language:

english

File:

PDF, 549 KB

english, 2018

4

The infrared spectra (3500—150 cm-1) of aniline complexes of cobalt(II), nickel(II), copper(II) and zinc(II) halides

Julie A. Lee-Thorp, Jürg E. Rüede, David A. Thornton

Journal:

Journal of Molecular Structure

Year:

1978

Language:

english

File:

PDF, 500 KB

english, 1978

5

Special Issue on Computational Science and Engineering

Johnson, Chris, Keyes, David, Ruede, Ulrich

Journal:

SIAM Journal on Scientific Computing

Year:

2008

Language:

english

File:

PDF, 63 KB

english, 2008

6

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator

Ekberg, Mats, Smith, Bruce W., Fosshaug, Hans A., Ostrom, Thomas, Bjornangen, Peter, Utterback, Thomas, Skotte, Per-Uno, Higley, John, Ruede, David, Kishkovich, Oleg P.

Year:

2004

Language:

english

File:

PDF, 940 KB

english, 2004

7

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - New filter media development for effective control of trimethysilanol (TMS) and related low molecular weight silicon containing organic species in the photobay ambient

Grayfer, Anatoly, Archie, Chas N., Belanger, Frank V., Cate, Phillip, Ruede, David

Year:

2007

Language:

english

File:

PDF, 559 KB

english, 2007

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Advances in the understanding of low molecular weight silicon formation and implications for control by AMC filters

Lobert, Jürgen M., Raymond, Christopher J., Cate, Philip W., Ruede, David J., Wildgoose, Joseph R., Miller, Charles M., Gaudreau, John C.

Year:

2010

Language:

english

File:

PDF, 540 KB

english, 2010

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